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검색간략리스트

1.
단행본
特許法 = Patent Law / 삽곡 달기 / 發明推進協會 / 346.530486 013b / 346.530486 / 2013 / 법학도서관
2.
저널기사
The role of feedgas chemistry, mask material, and processing parameters in profile evolution during plasma etching of Si(100)/ / Lane, J M / Published for the Society by the American Institute of Physics / Journal of vacuum science & technology. / p.2067-2079 / 2000
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