충남대학교외국학술지지원센터

글로벌메뉴

  • HOME
  • sitemap

주메뉴

임시보관함

  • |Home >
  • 임시보관함

검색간략리스트

1.
저널기사
Relation between the ion flux, gas phase composition, and wall conditions in chlorine plasma etching of silicon/ / Ullal, S. J / Published for the Society by the American Institute of Physics / Journal of vacuum science & technology. / 589-595p. / 2003
임시보관함비우기

하단메뉴