1 |
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The role of feedgas chemistry, mask material, and processing parameters in profile evolution during plasma etching of Si(100)/
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Lane, J M
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Published for the Society by the American Institute of Physics
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2000
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2 |
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Electron temperature, density, and metastable-atom density of argon electron-cyclotron-resonance plasma discharged by 7.0, 8.0, and 9.4 GHz microwaves/
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Kawai, Y
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Published for the Society by the American Institute of Physics
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2000
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3 |
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Effects of increasing nitrogen concentration on the structure of carbon nitride films deposited by ion beam assisted deposition/
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Hammer, P
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Published for the Society by the American Institute of Physics
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2000
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4 |
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Luminous efficiency and secondary electron emission characteristics of alternating current plasma display panels with MgO-SrO-CaO protective layers/
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Kim, Rakhwan
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Published for the Society by the American Institute of Physics
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2000
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5 |
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Mass spectral investigation of the plasma phase of a pulsed plasma of acrylic acid/
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Haddow, D B
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Published for the Society by the American Institute of Physics
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2000
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6 |
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Electrical properties of thin gate dielectric grown by rapid thermal oxidation/
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Lee, J S
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Published for the Society by the American Institute of Physics
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2000
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7 |
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Postdeposition annealing of pulsed laser deposited CNx films/
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Gonz�lez, P
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Published for the Society by the American Institute of Physics
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2000
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8 |
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INDEX - Summary of the Physics and Astronomy Classification Scheme-2000/
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Published for the Society by the American Institute of Physics
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2000
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9 |
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Author Index to Volume 18 ///
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Published for the Society by the American Institute of Physics
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2000
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10 |
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PACS Headings Used in the Present Index/
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Published for the Society by the American Institute of Physics
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2000
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