81 |
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Analysis of stresses in Ru thin films prepared by chemical vapor deposition/
|
Lim, H. J
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Published for the Society by the American Institute of Physics
|
2003
|
|
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82 |
|
Comparison of the stability of hot and cold cathode ionization gauges/
|
Li, D
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Published for the Society by the American Institute of Physics
|
2003
|
|
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83 |
|
Etching silicon by SF~6 in a continuous and pulsed power helicon reactor/
|
Herrick, A
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
84 |
|
Indium tin oxide films with low resistivity and low internal stress/
|
Takayama, S
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
85 |
|
Damage effects from medium-energy ion bombardment during the growth of cubic-boron nitride films/
|
Gago, R
|
Published for the Society by the American Institute of Physics
|
2003
|
|
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86 |
|
Observation of the phase formation in Fe-N films deposited by reactive pulsed laser deposition/
|
Wang, N
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
87 |
|
X-ray diffraction analyses of titanium coatings produced by electron beam evaporation in neon and argon inert gases/
|
Avelar-Batista, J. C
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Published for the Society by the American Institute of Physics
|
2003
|
|
|
88 |
|
Study of C~4F~8/N~2 and C~4F~8/Ar/N~2 plasmas for highly selective organosilicate glass etching over Si~3N~4 and SiC/
|
Hua, X
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
89 |
|
Microstructural evolution during film growth/
|
Petrov, I
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
90 |
|
Chemical methods of thin film deposition: Chemical vapor deposition, atomic layer deposition, and related technologies/
|
Crowell, J. E
|
Published for the Society by the American Institute of Physics
|
2003
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