| 1 |
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Abatement of C2F6 in rf and microwave plasma reactors/
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Vitale, Steven A
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Published for the Society by the American Institute of Physics
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2000
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| 2 |
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A conductance model (approach) for kinetic studies: The Ti-Ta-Si system/
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Pelleg, Joshua
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Published for the Society by the American Institute of Physics
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2000
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| 3 |
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Aligned silicon carbide nanocrystals at the SiO2/Si interface by C implantation into SiO2 matrices/
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Chen, Chang-Ming
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Published for the Society by the American Institute of Physics
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2000
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| 4 |
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Alternative NH4F/HCl solution for ultraclean Si(001) surface/
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Bok, T H
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Published for the Society by the American Institute of Physics
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2000
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| 5 |
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Amorphous carbon films deposited by direct current-magnetron sputtering: Vold distribution investigated by gas effusion and small angle x-ray scattering experiments/
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Freiree Jr, F L
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Published for the Society by the American Institute of Physics
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2000
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| 6 |
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Analysis of chlorine-containing plasmas applied in III/V semiconductor processing/
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Franz, Gerhard
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Published for the Society by the American Institute of Physics
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2000
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| 7 |
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Analysis of silicon-oxide-silicon nitride stacks by medium-energy ion scattering
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Landheer, D
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Published for the Society by the American Institute of Physics
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2000
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| 8 |
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An anomalous erosion of a rectangular magnetron system/
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Shidoji, Eiji
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Published for the Society by the American Institute of Physics
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2000
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| 9 |
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Angular dependence of SiO2 etching in a fluorocarbon plasma/
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Cho, Byeong-Ok
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Published for the Society by the American Institute of Physics
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2000
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| 10 |
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Atomic force microscopy investigation of nanometer-scale modifications of polymer morphology caused by ultraviolet irradiation/
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Nowicki, M
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Published for the Society by the American Institute of Physics
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2000
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| 11 |
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Author Index to Volume 18 ///
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Published for the Society by the American Institute of Physics
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2000
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| 12 |
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Carbon deposition by electron beam cracking of hydrocarbons on Ta2Zn3O8 thin film phosphors/
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Kondoleon, Caroline A
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Published for the Society by the American Institute of Physics
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2000
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| 13 |
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Change in surface roughness with the thickness of TiO2 film grown on MgO(001) by Ar-ion beam sputtering/
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Uchitani, Takeshi
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Published for the Society by the American Institute of Physics
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2000
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| 14 |
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Characteristics of ZnO:Cr thin films deposited by spray pyrolysis/
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Maldonado, A
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Published for the Society by the American Institute of Physics
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2000
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| 15 |
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Characterization of step coverage change in ultraviolet-transparent plasma enhanced chemical vapor deposition silicon nitride films/
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Bierner, J
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Published for the Society by the American Institute of Physics
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2000
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| 16 |
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Characterization studies of diamond-like carbon films grown using a saddle-field fast-atom-beam source/
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Sarangi, D
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Published for the Society by the American Institute of Physics
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2000
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| 17 |
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Chemical structure change of thin films prepared from nonpolymeric organic compounds by pulsed laser deposition/
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Kajitani, Takahiro
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Published for the Society by the American Institute of Physics
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2000
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| 18 |
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Chemical vapor deposition of Ru thin films by direct liquid injection of Ru(OD)3 (OD=octanedionate)/
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Lee, Jung-Hyun
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Published for the Society by the American Institute of Physics
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2000
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| 19 |
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Cl2-based dry etching of GaN films under inductively coupled plasma conditions/
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Im, Y H
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Published for the Society by the American Institute of Physics
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2000
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| 20 |
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Codeposition on diamond film surface during reactive ion etching in SF6 and O2 Plasmas/
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Teii, K
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Published for the Society by the American Institute of Physics
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2000
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