| 181 |
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Effects of plasma excitation power, sample bias, and duty cycle on the structure and surface properties of amorphous carbon thin films fabricated on AlSl440 steel by plasma immersion ion implantation/
|
Zeng, Z M
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Published for the Society by the American Institute of Physics
|
2000
|
|
|
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| 182 |
|
Effects of pretreatment on the performance of diamond-coated cemented carbide cutting tools/
|
Wang, Q
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Published for the Society by the American Institute of Physics
|
2003
|
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| 183 |
|
Effects of Si addition on the microstructural evolution and hardness of Ti-Al-Si-N films prepared by the hybrid system of arc ion plating and sputtering techniques/
|
Park, I.-W
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
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| 184 |
|
Effects of starting material of aluminum doped zinc oxide underlayer on the electric properties of palladium doped silver film/
|
Oyama, T
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Published for the Society by the American Institute of Physics
|
2003
|
|
|
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| 185 |
|
Effects of thermal annealing on the interface morphology of CdTe/CdS heterojunctions/
|
Huang, S
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
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| 186 |
|
Effects of titanium content on sol-gel hard optical films prepared in an organic-inorganic hybrid system/
|
Que, W
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
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| 187 |
|
Effects of ultraviolet/ozone treatment on benzocyclobutene films/
|
Viallet, B
|
Published for the Society by the American Institute of Physics
|
2003
|
|
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| 188 |
|
Effects of wall contamination on consecutive plasma processes/
|
Yasuda, H K
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
|
| 189 |
|
Effects of W doping and annealing parameters on the ferroelectricity and fatigue properties of sputtered Bi~3~.~2~5La~0~.~7~5Ti~3O~1~2 films/
|
Lin, W.-T
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
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| 190 |
|
Effects of ZnO buffer layer on the luminous properties of thin-film phosphors deposited on ZnO/ITO/ glass substrates/
|
Kim, Young Jin
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
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| 191 |
|
Electrical characteristics of nitrogen incorporated hydrogenated amorphous carbon/
|
Magill, D P
|
Published for the Society by the American Institute of Physics
|
2001
|
|
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| 192 |
|
Electrical characteristics of ZrO~2 prepared by electrochemical anodization of Zr in an ammonium tartrate electrolyte/
|
Jeon, S
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
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| 193 |
|
Electrical contact behavior of Ni/C60/4H-SiC structures/
|
Lu, W
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
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| 194 |
|
Electrical properties of silicon nitride films prepared by electron cyclotron resonance assisted sputter deposition/
|
Vargheese, K Deenamma
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
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| 195 |
|
Electrical properties of thin gate dielectric grown by rapid thermal oxidation/
|
Lee, J S
|
Published for the Society by the American Institute of Physics
|
2000
|
|
|
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| 196 |
|
Electrochemical characterization and surface analysis of bulk amorphous alloys in aqueous solutions at different p*H/
|
Schennach, R
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
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| 197 |
|
Electrochemical fluorine source for ultrahigh vacuum dosing/
|
Nakayama, Koji S
|
Published for the Society by the American Institute of Physics
|
2000
|
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|
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| 198 |
|
Electroless plating of copper on poly(tetrafluoroethylene) films modified by NH3 plasma and surface graft copolymerization with aniline/
|
Ma, Z H
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
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| 199 |
|
Electron emission from ion bombarded stainless-steel surfaces coated and noncoated with TiN and its relevance to the design of high intensity storage rings/
|
Hanson, A L
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
|
| 200 |
|
Electronic and structural properties of doped amorphous and nanocrystalline silicon deposited at low substrate temperatures by radio-frequency plasma-enhanced chemical vapor deposition/
|
Alpuim, P
|
Published for the Society by the American Institute of Physics
|
2003
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Valentini, L
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