| 241 |
|
Experimental study on a new sterilization process using plasma source ion implantation with N~2 gas/
|
Yoshida, M
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
|
| 242 |
|
Fabrication and characterization of C implantation standards for Si1-x-yGexCy alloys/
|
Laursen, T
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
|
| 243 |
|
Fabrication of ferromagnetic/semiconductor waveguide structures and application to microwave bandstop filter/
|
Wu, W
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
|
| 244 |
|
Fabrication of micro and submicro-Y-Ba-Cu-O particles by excimer laser processing/
|
Luo, G P
|
Published for the Society by the American Institute of Physics
|
2000
|
|
|
|
| 245 |
|
Fabrication of microstructured copper on an indium-tin-oxide surface using a micropatterned self-assembled monolayer as a template/
|
Asakura, S
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
|
| 246 |
|
Fabrication of smooth diamond films on SiO2 by the addition of nitrogen to the gas feed in hot-filament chemical vapor deposition/
|
Baranauskas, Vitor
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
|
| 247 |
|
Fabrication of ZnO-doped Zr0.8Sn0.2TiO4 thin films by radio frequency magnetron sputtering/
|
Huang, Cheng-Liang
|
Published for the Society by the American Institute of Physics
|
2000
|
|
|
|
| 248 |
|
Fast x-ray spectroscopy study of ethene on clean and SO~4 precovered Pt{111}/
|
Lee, A. F
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
|
| 249 |
|
Feature profile evolution in high-density plasma etching of silicon with Cl~2/
|
Jin, W
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
|
| 250 |
|
Fe-doped photocatalytic TiO~2 film prepared by pulsed dc reactive magnetron sputtering/
|
Zhang, W
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
|
| 251 |
|
Field-assisted metal-induced crystallization of amorphous silicon films/
|
Khakifirooz, Ali
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
|
| 252 |
|
Field-emission properties of vertically aligned carbon-nanotube array dependent on gas exposures and growth conditions/
|
Lim, S C
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
|
| 253 |
|
Fifty years of vacuum science/
|
Hobson, J. P
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
|
| 254 |
|
Film growth precursors in a remote SiH4 plasma used for high-rate deposition of hydrogenated amorphous silicon/
|
Kessels, W M M
|
Published for the Society by the American Institute of Physics
|
2000
|
|
|
|
| 255 |
|
Fluorinated amorphous carbon films prepared by plasma enhanced chemical vapor deposition for solar cell applications/
|
Valentini, L
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
|
| 256 |
|
Fluorinated amorphous carbon thin films: Analysis of the role of the plasma excitation mode on the structural and mechanical properties/
|
Valentini, L
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
|
| 257 |
|
Fluorinated amorphous carbon thin films: Analysis of the role of the plasma source frequency on the structural and optical properties/
|
Valentini, L
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
|
| 258 |
|
Fluorinated ethylene propylene copolymer coating for the stability enhancement of electroactive and photoactive systems/
|
Zhao, L
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
|
| 259 |
|
Fluorocarbon polymer deposition kinetics in a low-pressure, high-density, inductively coupled plasma reactor/
|
Sowa, M J
|
Published for the Society by the American Institute of Physics
|
2000
|
|
|
|
| 260 |
|
Focusing of MeV ion beams by means of tapered glass capillary optics/
|
Nebiki, T
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
|