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총 1,892건 중 1,892건 출력

21/95 페이지

제한항목: American Institute of Physics

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검색리스트 테이블
No	서명	저자	발행처	원문제공시작년
401	Characteristics of Sm~2Fe~1~7C~x compounds prepared from ball-milled blends of Sm~2Fe~1~7 and graphite	Mao, O	American Institute of Physics	1980

402	Characteristics of stacking faults in AlN thin films	Dovidenko, K	American Institute of Physics	1980

403	Characteristics of the high density plasma production by m=0 helicon wave	Sakawa, Y	American Institute of Physics	1980

404	Characteristics of the low energy photoluminescence in mc-Si films/	Yue, Guozhen	American Institute of Physics	2000

405	Characteristic temperature study of GaAsP-AlGaAs tensile strained quantum well lasers/	Tolliver, Todd R	American Institute of Physics	2000

406	Characterization and minimization of flicker in silicon light valves/	Huang, H C	American Institute of Physics	2001

407	Characterization and modelling of the strain fields associated with InGaAs layers on V-grooved InP substrates	Gupta, A	American Institute of Physics	1980

408	Characterization methodology for pseudomorphic high electron mobility transistors using surface photovoltage spectroscopy/	Solodky, S	American Institute of Physics	2000

409	Characterization of 3C-SiC crystals grown by thermal decomposition of methyltrichlorosilane	Steckl, A. J	American Institute of Physics	1980

410	Characterization of 3C-SiC films grown on monocrystalline Si by reactivehydrogen plasma sputtering	Sun, Y	American Institute of Physics	1980

411	Characterization of a-C:H:N deposition from CH~4/N~2 rf plasma using optical emission spectroscopy	Clay, K. J	American Institute of Physics	1980

412	Characterization of amorphous Ge~xSi~1~ ~-~ ~xO~y for micromachined uncooled bolometer applications/	Ahmed, A. H. Z	American Institute of Physics	2003

413	Characterization of amorphous hydrogenated carbon nitride films preparedby plasma-enhanced chemical vapor deposition using a helical resonator discharge	Joon Han Kim	American Institute of Physics	1980

414	Characterization of an F-center in an alkali halide cluster	Bader, R. F. W	American Institute of Physics	1980

415	Characterization of a partially-ionized, detached, divertor plasma	Knoll, D. A	American Institute of Physics	1980

416	Characterization of a-Si:H based metal/insulator/semiconductor structures by feedback charge capacitance-voltage measurements and charge deep-level transient spectroscopy	Thurzo, I	American Institute of Physics	1980

417	Characterization of atomic force microscope probes at low temperatures/	Radenovic, A	American Institute of Physics	2003

418	Characterization of bond and etch-back silicon-on-insulator wafers by photoluminescence under ultraviolet excitation	Tajima, M	American Institute of Physics	1980

419	Characterization of boron silicide layer deposited by ultrahigh-vacuum chemical-vapor deposition	Tseng, H.-C	American Institute of Physics	1980

420	Characterization of carbon adsorption to Si(100) surface by thermal desorption spectroscopy and x-ray photoelectron spectroscopy	Matsuo, N	American Institute of Physics	1980

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