| 1 |
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A Direct Simulation Monte Carlo Study of Flow Considerations in Plasma Reactor Development for 300 mm Processing
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Hash, D
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Electrochemical Society
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1980
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| 2 |
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A Dislocation Formation Model of Trench-Induced Dislocations in Dynamic Random Access Memories
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Dellith, M
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Electrochemical Society
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1980
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| 3 |
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Dealloying below the Critical Potential
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Wagner, K
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Electrochemical Society
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1980
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| 4 |
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Dechlorination of Monochlorobenzene Using Organic Mediators
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Kargina, O
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Electrochemical Society
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1980
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| 5 |
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Decomposition of Trichloroethylene by Microwave-Induced Plasma Generatedfrom SiC Whiskers
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Egashira, M
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Electrochemical Society
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1980
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| 6 |
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Defect Generation during Epitaxial CoSi~2 Formation Using Co/Ti Bilayer on Oxide Patterned (100)Si Substrate and Its Effect on the Electrical Properties
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Byun, J. S
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Electrochemical Society
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1980
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| 7 |
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Defects Induced by Deep Preamorphization and Their Effects on Metal Oxide Semiconductor Device Characteristics
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Miyake, M
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Electrochemical Society
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1980
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| 8 |
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Deformation Mechanism of Porous Nickel Oxide in Molten Li/K Carbonates
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Murai, M
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Electrochemical Society
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1980
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| 9 |
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Deformation of Porous Silicon Lattice Caused by Absorption/Desorption Processes
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Chelyadinsky, A. R
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Electrochemical Society
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1980
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| 10 |
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Degradation of Solid Oxide Fuel Cell Anodes Due to Sintering of Metal Particles. Correlated Percolation Model
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Ioselevich, A
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Electrochemical Society
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1980
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| 11 |
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Dehydroxylation of LiAlCl~4 �xSO~2 Electrolytes Using Chlorine
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Hill, I. R
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Electrochemical Society
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1980
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| 12 |
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Delaminations of Thin Layers by High Dose Hydrogen Ion Implantation in Silicon. Formation of Thin Silicon on Insulator Silicon Layers
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Hara, T
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Electrochemical Society
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1980
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| 13 |
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Densification of Yttria-Stabilized Zirconia. Impedance Spectroscopy Analysis
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Steil, M. C
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Electrochemical Society
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1980
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| 14 |
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Density and Viscosity Measurements of Zincate/KOH Solutions
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Siu, S
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Electrochemical Society
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1980
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| 15 |
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Density of States Calculations of Small Diameter Single Graphene Sheets
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Gerouki, A
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Electrochemical Society
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1980
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| 16 |
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Dependence of Electro-optical Properties on the Deposition Conditions ofChemical Bath Deposited CdS Thin Films
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Do�, J. M
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Electrochemical Society
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1980
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| 17 |
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Dependence of Mechanical Strength of Czochralski Silicon Wafers on the Temperature of Oxygen Precipitation Annealing
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Sueoka, K
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Electrochemical Society
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1980
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| 18 |
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Dependence on Morphology of Oxygen Precipitates upon Oxygen Supersaturation in Czochralski Silicon Crystals
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Fujimori, H
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Electrochemical Society
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1980
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| 19 |
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Deposition of Carbon-Rich Film during Etching of Aluminum and Aluminum Oxide Surfaces
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Tonotani, J
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Electrochemical Society
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1980
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| 20 |
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Deposition of Conducting Polyaniline Patterns with the Scanning Electrochemical Microscope
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Zhou, J
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Electrochemical Society
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1980
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