| 41 |
|
Determination of Mixtures of Polysulfides by Cyclic Voltammetry
|
Le Guillanton, G
|
Electrochemical Society
|
1980
|
|
|
|
| 42 |
|
Determination of Oxygen Nonstoichiometry and Diffusivity in Mixed Conducting Oxi
|
Lankhorst, M. H. R
|
Electrochemical Society
|
1980
|
|
|
|
| 43 |
|
Determination of Oxygen Nonstoichiometry and Diffusivity in Mixed Conducting Oxi
|
Lankhorst, M. H. R
|
Electrochemical Society
|
1980
|
|
|
|
| 44 |
|
Determination of the Critical Temperature for Forming a Chromium-Rich Oxide on AISI 430 Stainless Steel and Its Corrosion Resistance
|
Yen, S. K
|
Electrochemical Society
|
1980
|
|
|
|
| 45 |
|
Determination of Transport and Electrochemical Kinetic Parameters of Bare and Copper-Coated LaNi~4~.~2~7Sn~0~.~2~4 Electrodes in Alkaline Solution
|
Zheng, G
|
Electrochemical Society
|
1980
|
|
|
|
| 46 |
|
Determining the Critical Crevice Depth for Iron in a Sodium Acetate-Acetic Acid Buffer Solution/
|
Vankeerberghen, M
|
Electrochemical Society
|
2003
|
|
|
|
| 47 |
|
Development and Characterization of a Thick-Film Printed Zinc-Alkaline Battery/
|
Ghiurcan, G. A
|
Electrochemical Society
|
2003
|
|
|
|
| 48 |
|
Development and Characterization of Electrochemical Devices Using Ultraviolet Laser Induced Carbonization of Polyimide Films
|
Wynn, G. H
|
Electrochemical Society
|
1980
|
|
|
|
| 49 |
|
Development of a Photoresist Removal Method Using Ozone Gas with Water Vapor for LCD Manufacturing/
|
Noda, S
|
Electrochemical Society
|
2003
|
|
|
|
| 50 |
|
Development of Ceramic Gas Separator for SOFCs/
|
Murata, K
|
Electrochemical Society
|
2003
|
|
|
|
| 51 |
|
Development of Dissolved Hydrogen Sensors Based on Yttria-Stabilized Zirconia Solid Electrolyte with Noble Metal Electrodes
|
Hara, N
|
Electrochemical Society
|
1980
|
|
|
|
| 52 |
|
Development of Surface Impurity Segregation during Dissolution of Aluminum
|
Wu, X
|
Electrochemical Society
|
1980
|
|
|
|
| 53 |
|
Diamond/SiC Double Layer Membrane for X-Ray Mask
|
Noguchi, H
|
Electrochemical Society
|
1980
|
|
|
|
| 54 |
|
Dielectric Constant and Stability of Fluorine-Doped Plasma Enhanced Chemical Vapor Deposited SiO~2 Thin Films
|
Lee, P. W
|
Electrochemical Society
|
1980
|
|
|
|
| 55 |
|
Dielectric Degradation of Cu/SiO~2/Si Structure during Thermal Annealing
|
Chiou, J.-C
|
Electrochemical Society
|
1980
|
|
|
|
| 56 |
|
Dielectric Properties of Radio Frequency Magnetron Sputter Deposited Zirconium Titanate-Based Thin Films
|
Ramakrishnan, E. S
|
Electrochemical Society
|
1980
|
|
|
|
| 57 |
|
Dielectric Science and Materials - A Method of Making Oxynitrides by Interface Nitridation Through Silicon/
|
Suizu, Y
|
Electrochemical Society
|
2001
|
|
|
|
| 58 |
|
Dielectric Science and Materials - Application of Charge-Based Capacitance Measurement Technique in Characterization of Hydrogen Silsesquioxane/
|
Siew, Y K
|
Electrochemical Society
|
2001
|
|
|
|
| 59 |
|
Dielectric Science and Materials - Atomic Layer Deposition of High Dielectric Constant Nanolaminates/
|
Zhang, H
|
Electrochemical Society
|
2001
|
|
|
|
| 60 |
|
Dielectric Science and Materials - Carbon Enhancement of SiO2 Nucleation in Buried Oxide Synthesis - Computer Simulations and Secondary Ion Mass Spectroscopy Depth Profiling/
|
Efremov, A A
|
Electrochemical Society
|
2001
|
|
|
|