| 1 |
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ilicon etching yields in F2, Cl2, Br2, and HBr high density plasmas/
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Vitale, Steven A
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Published for the Society by the American Institute of Physics
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2001
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| 2 |
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Impact of plasma processing on integrated circuit technology migration: From 1 mum to 100 nm and beyond/
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Tachi, S
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Published for the Society by the American Institute of Physics
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2003
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| 3 |
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Impression of high voltage pulses on substrate in pulsed laser deposition/
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Ikegami, T
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Published for the Society by the American Institute of Physics
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2001
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| 4 |
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Improved Auger electron spectroscopy sputter depth profiling of W/WNx and WSix layers on Si substrates/
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Goryachko, A
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Published for the Society by the American Institute of Physics
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2001
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| 5 |
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Improvement of bond strength of plasma-sprayed hydroxyapatite/titanium composite coatings on titanium: Partial nitriding of titanium deposits by rf thermal plasma/
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Inagaki, M
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Published for the Society by the American Institute of Physics
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2003
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| 6 |
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Improvement of luminance and luminous efficiency for optimal Penning gas mixtures in alternating current plasma display panels/
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Lee, S.-J
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Published for the Society by the American Institute of Physics
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2003
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| 7 |
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INDEX - Summary of the Physics and Astronomy Classification Scheme-2000/
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Published for the Society by the American Institute of Physics
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2000
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| 8 |
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Indium tin oxide films with low resistivity and low internal stress/
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Takayama, S
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Published for the Society by the American Institute of Physics
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2003
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| 9 |
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Inductively coupled Cl~2/Ar plasma: Experimental investigation and modeling/
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Efremov, A. M
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Published for the Society by the American Institute of Physics
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2003
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| 10 |
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Inductively coupled plasmas in oxygen: Modeling and experiment/
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Kiehlbauch, M. W
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Published for the Society by the American Institute of Physics
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2003
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| 11 |
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Inelastic collisions of electrons and positrons in solids and the dawn of surface science/
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Duke, C. B
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Published for the Society by the American Institute of Physics
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2003
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| 12 |
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Influence of annealing temperature on simultaneous vapor deposited calcium phosphate thin films/
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Hamdi, M
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Published for the Society by the American Institute of Physics
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2001
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| 13 |
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Influence of carbon content and average energy of deposited ions on mechanical and optical properties of Si-C-N films grown by plasma ion immersion processing/
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Afanasyev-Charkin, I. V
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Published for the Society by the American Institute of Physics
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2003
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| 14 |
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Influence of elastic-electron scattering on measurements of silicon dioxide film thicknesses by x-ray photoelectron spectroscopy/
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Powell, C J
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Published for the Society by the American Institute of Physics
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2001
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| 15 |
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Influence of energetic bombardment on stress, resistivity, and microstructure of indium tin oxide films grown by radio frequency magnetron sputtering on flexible polyester substrates/
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Carcia, P. F
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Published for the Society by the American Institute of Physics
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2003
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| 16 |
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Influence of ion stimulated gas desorption from residual gas analyzer on partial pressure measurement/
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Kurokouchi, Satoshi
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Published for the Society by the American Institute of Physics
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2001
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| 17 |
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Influence of modeling and simulation on the maturation of plasma technology: Feature evolution and reactor design/
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Graves, D. B
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Published for the Society by the American Institute of Physics
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2003
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| 18 |
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Influence of oxygen background pressure on the structure and properties of epitaxial SrTiO3/La0.35Nd0.35Sr0.3MnO3 heterostructures grown by pulsed laser deposition/
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Wu, Wenbin
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Published for the Society by the American Institute of Physics
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2000
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| 19 |
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Influence of Pt underlayer on the magnetic and magneto-optical properties of sputtered Co0.25Pt0.75 alloy films, and the static recording performance/
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Zou, Z Q
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Published for the Society by the American Institute of Physics
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2000
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| 20 |
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Influence of sputtering conditions on microstructure and mechanical properties of Zr-Si-N films prepared by radio-frequency-reactive sputtering/
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Zhou, M
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Published for the Society by the American Institute of Physics
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2003
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기사
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