| 41 |
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Interfacial interactions of polymer coatings with oxide-free phosphate films on metal surfaces/
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Wang, Y
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Published for the Society by the American Institute of Physics
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2003
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| 42 |
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Interfacial reaction pathways and kinetics during annealing of 111-textured Al/TiN bilayers: A synchrotron x-ray diffraction and transmission electron microscopy study/
|
Chun, J-S
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Published for the Society by the American Institute of Physics
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2001
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| 43 |
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Interfacial silicon oxide formation during oxygen annealing of Ta2O5 thin films on Si: Oxygen isotope labeling/
|
Park, H J
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Published for the Society by the American Institute of Physics
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2000
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| 44 |
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Interpretation of the Shirley background in x-ray photoelectron spectroscopy analysis/
|
Castle, J E
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Published for the Society by the American Institute of Physics
|
2001
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| 45 |
|
Introduction: 50 Years of Science, Technology, and the AVS (1953-2003)/
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Published for the Society by the American Institute of Physics
|
2003
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| 46 |
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Investigation of diamond film deposition on steel without and with ion beam nitriding pretreatment/
|
Shang, N G
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Published for the Society by the American Institute of Physics
|
2001
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| 47 |
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Investigation of dilute SF6 discharges for application to SiC reactive ion etching/
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Scofield, J D
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Published for the Society by the American Institute of Physics
|
2000
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| 48 |
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Investigation of interactions between inert gases and nitrogen in direct current triode discharges/
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Davison, A
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Published for the Society by the American Institute of Physics
|
2003
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| 49 |
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Investigation of oxide (V~2O~5) thin films as electrodes for rechargeable microbatteries using Li/
|
Talledo, A
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Published for the Society by the American Institute of Physics
|
2003
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| 50 |
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Investigation of polycrystalline silicon grain structure with single wafer chemical vapor deposition technique/
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Bu, H
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Published for the Society by the American Institute of Physics
|
2001
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| 51 |
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Investigation of Si-doped diamond-like carbon films synthesized by plasma immersion ion processing/
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He, X M
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Published for the Society by the American Institute of Physics
|
2000
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| 52 |
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Investigation of SrBi~2Ta~2O~9 thin films etching mechanisms in Cl~2/Ar plasma/
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Efremov, A. M
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Published for the Society by the American Institute of Physics
|
2003
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| 53 |
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Investigation of the adhesion, friction, and wear properties of biphenyl thiol self-assembled monolayers by atomic force microscopy/
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Liu, Huiwen
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Published for the Society by the American Institute of Physics
|
2001
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| 54 |
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Investigation of the morphology of the initial growth of the aromatic molecule p-quaterphenyl on NaCl (001)/
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Kintzel Jr, E J
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Published for the Society by the American Institute of Physics
|
2001
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| 55 |
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Investigation of the outgassing characteristics of the materials comprising a plasma display panel/
|
Han, H R
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Published for the Society by the American Institute of Physics
|
2001
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| 56 |
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Investigation of the penetration of atomic hydrogen from the gas phase into SiO2/GaAs/
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Kagadei, V A
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Published for the Society by the American Institute of Physics
|
2001
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| 57 |
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Investigation of the role of plasma conditions on the deposition rate and electrochromic performance of tungsten oxide thin films/
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Seman, M
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Published for the Society by the American Institute of Physics
|
2003
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| 58 |
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Ion and substrate effects on surface reactions of CF2 using C2F6, C2F6/H2, and hexafluoropropylene oxide plasmas/
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Butoi, Carmen I
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Published for the Society by the American Institute of Physics
|
2000
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| 59 |
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Ion-assisted deposition of silicon nitride films using electron cyclotron resonance plasma/
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Vargheese, K Deenamma
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Published for the Society by the American Institute of Physics
|
2001
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| 60 |
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Ion bombardment energy and SiO2/Si fluorocarbon plasma etch selectivity/
|
Wang, S-B
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Published for the Society by the American Institute of Physics
|
2001
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