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61 저널기사 Ion energy and angular distribution at the radio frequency biased electrode in an inductively coupled plasma apparatus/ 미리보기
Mizutani, Naoki Published for the Society by the American Institute of Physics 2001
62 저널기사 Ion energy distributions and the density of CH~3 radicals in a low pressure inductively coupled CH~4/H~2 plasma used for nanocrystalline diamond deposition/ 미리보기
Okada, K Published for the Society by the American Institute of Physics 2003
63 저널기사 Ion fluxes and energies in inductively coupled radio-frequency discharges containing C2F6 and c-C4F8/ 미리보기
Goyette, A N Published for the Society by the American Institute of Physics 2000
64 저널기사 Ionic densities and ionization fractions of sputtered titanium in radio frequency magnetron sputtering/ 미리보기
Okimura, K Published for the Society by the American Institute of Physics 2003
65 저널기사 Ionization of sputtered material in a planar magnetron discharge/ 미리보기
Christou, C Published for the Society by the American Institute of Physics 2000
66 저널기사 Ion kinetic energy control in dual plasma deposition of thin films/ 미리보기
Wang, L P Published for the Society by the American Institute of Physics 2001
67 저널기사 Iron oxide thin films prepared by ion beam induced chemical vapor deposition: Structural characterization by infrared spectroscopy/ 미리보기
Yubero, F Published for the Society by the American Institute of Physics 2000
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