| 1 |
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Radical detection in a methane plasma/
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Kang, H. D
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Published for the Society by the American Institute of Physics
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2003
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| 2 |
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Radio frequency siliconization: An approach to the coating for the future large superconducting fusion devices/
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Li, J
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Published for the Society by the American Institute of Physics
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2001
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| 3 |
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Rainbow scattering of CH4 and C2H6 molecular beams from a LiF(001) surface: Dependence on incident kinetic energy and molecular anisotropy/
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Kondo, Takahiro
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Published for the Society by the American Institute of Physics
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2001
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| 4 |
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Raman and photoluminescence of ZnO films deposited on Si (111) using low-pressure metalorganic chemical vapor deposition/
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Ye, J
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Published for the Society by the American Institute of Physics
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2003
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| 5 |
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Reaction between nitrogen gas and silicon species during pulsed laser ablation/
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Umezu, I
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Published for the Society by the American Institute of Physics
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2003
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| 6 |
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Reaction kinetics on supported model catalysts: Molecular beam/in situ time-resolved infrared reflection absorption spectroscopy study of the CO oxidation on alumina supported Pd particles/
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Libuda, J
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Published for the Society by the American Institute of Physics
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2001
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| 7 |
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Reaction layer dynamics in ion-assisted Si/XeF2 etching: Temperature dependence/
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Sebel, P G M
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Published for the Society by the American Institute of Physics
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2000
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| 8 |
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Reaction of gas-phase atomic hydrogen with NO on Ru(001)/
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Kim, Tae Won
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Published for the Society by the American Institute of Physics
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2001
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| 9 |
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Reaction sequence of Co`/Ni/Si(001) system/
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Guo, S. S
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Published for the Society by the American Institute of Physics
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2003
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| 10 |
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Reactions of acetaldehyde on UO2(111) single crystal surfaces. Evidence of benzene formation/
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Chong, S V
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Published for the Society by the American Institute of Physics
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2001
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| 11 |
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Reactive deposition of compounds by a cavity-hollow cathode direct current sputtering system/
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Kazemeini, Mehdi H
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Published for the Society by the American Institute of Physics
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2000
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| 12 |
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Reactive magnetron sputter-deposition of NbN and (Nb, Ti)N films related to sputtering source characterization and optimization/
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Iosad, N N
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Published for the Society by the American Institute of Physics
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2001
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| 13 |
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Reactive pulsed magnetron sputtering process for alumina films/
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Kelly, P J
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Published for the Society by the American Institute of Physics
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2000
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| 14 |
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Reactivity of heteropolyanions toward GaAs compound/
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Rothschild, A
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Published for the Society by the American Institute of Physics
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2000
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| 15 |
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Real-time control of ion density and ion energy in chlorine inductively coupled plasma etch processing/
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Chang, C.-H
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Published for the Society by the American Institute of Physics
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2003
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| 16 |
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Real-time etching monitor using argon quadrupole mass spectrometry for 100 nm class WSiN gate fabrication/
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Jin, Y
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Published for the Society by the American Institute of Physics
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2003
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| 17 |
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Real-time/in situ diffraction study of phase and microstructural evolution in sputtered b-Ta/Ta2O5 films/
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Whitacre, J F
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Published for the Society by the American Institute of Physics
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2001
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| 18 |
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Recommended practice for calibrating vacuum gauges of the thermal conductivity type/
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Ellefson, R E
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Published for the Society by the American Institute of Physics
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2000
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| 19 |
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Red SrTiO3:Pr,Al phosphor as potential field emission display material/
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Yokoyama, Meiso
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Published for the Society by the American Institute of Physics
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2000
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| 20 |
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Reduction of artifacts in temperature programmed desorption measurements of field generated, real-life, powered samples/
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Smentkowski, V S
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Published for the Society by the American Institute of Physics
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2001
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기사
(35)
