| 1 |
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A study for the bias control of indium-tin-oxide films synthesized by cesium assisted radio frequency magnetron sputtering/
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Lee, D. Y
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Published for the Society by the American Institute of Physics
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2003
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| 2 |
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Scanning spreading resistance microscopy study of a metalorganic chemical vapor deposited grown InP optoelectronic structure/
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Dixon-Warren, St J
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Published for the Society by the American Institute of Physics
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2001
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| 3 |
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Scanning tunneling microscopy imaging of charged defects on clean Si(100)-(2x1)/
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Brown, G. W
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Published for the Society by the American Institute of Physics
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2003
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| 4 |
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Scanning tunneling microscopy studies of the Cu:Si(5 5 12) system/
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Woodworth, P. H
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Published for the Society by the American Institute of Physics
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2003
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| 5 |
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Scanning tunneling microscopy study of the Er/Ge(111) c(2 X 8) interface/
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Pelletier, S
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Published for the Society by the American Institute of Physics
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2000
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| 6 |
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Scanning tunneling microscopy study of the molecular arrangement of meta- and para-xylene on Pd(111)/
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Futaba, D N
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Published for the Society by the American Institute of Physics
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2001
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| 7 |
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Search for improved transparent conducting oxides: A fundamental investigation of CdO, Cd2SnO4, and Zn2SnO4/
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Coutts, T J
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Published for the Society by the American Institute of Physics
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2000
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| 8 |
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Selective-area chemical-vapor deposition of Si using a bilayer dielectric mask patterned by proximal probe oxidation/
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Gwo, S
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Published for the Society by the American Institute of Physics
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2001
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| 9 |
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Self-assembly and magnetism in core-shell microspheres/
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Bizdoaca, E. L
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Published for the Society by the American Institute of Physics
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2003
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| 10 |
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Self-organization of large-area periodic nanowire arrays by glancing incidence ion bombardment of CaF2(111) surfaces/
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Batzill, Matthias
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Published for the Society by the American Institute of Physics
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2001
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| 11 |
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Semi-empirical modeling of the optical gap of amorphous hydrogenated nitrogenated carbon films/
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Santo, Larissa L E
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Published for the Society by the American Institute of Physics
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2000
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| 12 |
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Sensitivity studies of silicon etching in chlorine/argon plasmas/
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Kleditzsch, S
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Published for the Society by the American Institute of Physics
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2000
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| 13 |
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Sensor fault detection in etch based on broadband rf signal observation/
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Park, H.-M
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Published for the Society by the American Institute of Physics
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2003
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| 14 |
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Sequential turret source-masking system for fabrication of multilayer structures
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Anthopoulos, T
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Published for the Society by the American Institute of Physics
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2000
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| 15 |
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Shape transformation of silicon trenches during hydrogen annealing/
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Kuribayashi, H
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Published for the Society by the American Institute of Physics
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2003
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| 16 |
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Si etching rate calculation for low pressure high density plasma source using Cl2 gas/
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Lee, Young D
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Published for the Society by the American Institute of Physics
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2000
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| 17 |
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Simple vacuum heater and its application for annealing TiO2 films/
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Liu, Chian
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Published for the Society by the American Institute of Physics
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2001
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| 18 |
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Simplified model for calculating the pressure dependence of a direct current planar magnetron discharge/
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Buyle, G
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Published for the Society by the American Institute of Physics
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2003
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| 19 |
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Simulation of the production of atomic hydrogen in a low-pressure-arc-discharge-based source/
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Kagadei, V A
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Published for the Society by the American Institute of Physics
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2001
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| 20 |
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SiO~2 etching with perfluorobutadiene in a dual frequency plasma reactor/
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Fracassi, F
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Published for the Society by the American Institute of Physics
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2003
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