1 |
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Abatement of C2F6 in rf and microwave plasma reactors/
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Vitale, Steven A
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Published for the Society by the American Institute of Physics
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2000
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2 |
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Aligned silicon carbide nanocrystals at the SiO2/Si interface by C implantation into SiO2 matrices/
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Chen, Chang-Ming
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Published for the Society by the American Institute of Physics
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2000
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3 |
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Alternative NH4F/HCl solution for ultraclean Si(001) surface/
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Bok, T H
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Published for the Society by the American Institute of Physics
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2000
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4 |
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Amorphous carbon films deposited by direct current-magnetron sputtering: Vold distribution investigated by gas effusion and small angle x-ray scattering experiments/
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Freiree Jr, F L
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Published for the Society by the American Institute of Physics
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2000
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5 |
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Analysis of chlorine-containing plasmas applied in III/V semiconductor processing/
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Franz, Gerhard
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Published for the Society by the American Institute of Physics
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2000
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6 |
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Analysis of silicon-oxide-silicon nitride stacks by medium-energy ion scattering
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Landheer, D
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Published for the Society by the American Institute of Physics
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2000
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7 |
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An anomalous erosion of a rectangular magnetron system/
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Shidoji, Eiji
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Published for the Society by the American Institute of Physics
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2000
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8 |
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Angular dependence of SiO2 etching in a fluorocarbon plasma/
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Cho, Byeong-Ok
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Published for the Society by the American Institute of Physics
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2000
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9 |
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Atomic force microscopy investigation of nanometer-scale modifications of polymer morphology caused by ultraviolet irradiation/
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Nowicki, M
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Published for the Society by the American Institute of Physics
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2000
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10 |
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Author Index to Volume 18 ///
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Published for the Society by the American Institute of Physics
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2000
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