| 1 |
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Abatement of C2F6 in rf and microwave plasma reactors/
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Vitale, Steven A
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Published for the Society by the American Institute of Physics
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2000
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| 2 |
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Accommodation coefficient of tangential momentum on atomically clean and contaminated surfaces/
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Sazhin, Oleg V
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Published for the Society by the American Institute of Physics
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2001
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| 3 |
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Adhesion and friction studies of microelectromechanical systems/nanoelectromechanical systems materials using a novel microtriboapparatus/
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Liu, H
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Published for the Society by the American Institute of Physics
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2003
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| 4 |
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Adsorption and decomposition of (methylcyclopentadienyl) (1,5-cyclooctadiene) iridium on Rh/
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Yan, X-M
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Published for the Society by the American Institute of Physics
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2001
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| 5 |
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Adsorption and reaction of NO on oxidized and reduced SrTiO~3(100) surfaces/
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Azad, S
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Published for the Society by the American Institute of Physics
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2003
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| 6 |
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Adsorption of hydrogen on clean and potassium modified low index copper surfaces: Cu(100) and Cu(110)/
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Thomsen, L
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Published for the Society by the American Institute of Physics
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2001
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| 7 |
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Adsorption of oxygen on ultrathin Cu/Pt(111) films/
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Tsay, J S
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Published for the Society by the American Institute of Physics
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2001
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| 8 |
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Advanced Modeling and Control for IC Manufacturing - Data requirements and communication issues for advanced process control/
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Markle, Richard J
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Published for the Society by the American Institute of Physics
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2001
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| 9 |
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Affect on pumping-speed measurements due to variations of test dome design based on Monte Carlo analysis/
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Nesterov, S B
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Published for the Society by the American Institute of Physics
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2001
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| 10 |
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Aligned silicon carbide nanocrystals at the SiO2/Si interface by C implantation into SiO2 matrices/
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Chen, Chang-Ming
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Published for the Society by the American Institute of Physics
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2000
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| 11 |
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Alternative NH4F/HCl solution for ultraclean Si(001) surface/
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Bok, T H
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Published for the Society by the American Institute of Physics
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2000
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| 12 |
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Aluminum diffusion and nitrogen sputter yield for nitrogen plasma immersion ion implantation into aluminum/
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Manova, D
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Published for the Society by the American Institute of Physics
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2003
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| 13 |
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American Vacuum Society leadership in electronic materials processing: Past, present, and future/
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Lucovsky, G
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Published for the Society by the American Institute of Physics
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2003
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| 14 |
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Amino-terminated self-assembled monolayer on a SiO2 surface formed by chemical vapor deposition/
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Hozumi, Atsushi
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Published for the Society by the American Institute of Physics
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2001
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| 15 |
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Amorphous carbon films deposited by direct current-magnetron sputtering: Vold distribution investigated by gas effusion and small angle x-ray scattering experiments/
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Freiree Jr, F L
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Published for the Society by the American Institute of Physics
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2000
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| 16 |
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Analysis of chlorine-containing plasmas applied in III/V semiconductor processing/
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Franz, Gerhard
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Published for the Society by the American Institute of Physics
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2000
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| 17 |
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Analysis of silicon-oxide-silicon nitride stacks by medium-energy ion scattering
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Landheer, D
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Published for the Society by the American Institute of Physics
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2000
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| 18 |
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Analysis of stresses in Ru thin films prepared by chemical vapor deposition/
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Lim, H. J
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Published for the Society by the American Institute of Physics
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2003
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| 19 |
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Analysis of tunneling magnetoresistance test structures by low energy electron nanoscale-luminescence spectroscopy/
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Goss, S H
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Published for the Society by the American Institute of Physics
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2001
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| 20 |
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Analytic expressions of the speed factor for turbomolecular pumps/
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Chang, Yu-Wen
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Published for the Society by the American Institute of Physics
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2001
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기사
(33)
