21 |
|
An anomalous erosion of a rectangular magnetron system/
|
Shidoji, Eiji
|
Published for the Society by the American Institute of Physics
|
2000
|
|
|
22 |
|
Angular dependence of SiO2 etching in a fluorocarbon plasma/
|
Cho, Byeong-Ok
|
Published for the Society by the American Institute of Physics
|
2000
|
|
|
23 |
|
Angular dependence of the surface excitation probability for medium energy electrons backscattered from Al and Si surfaces/
|
Werner, Wolfgang S M
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
24 |
|
Antimony segregation in the oxidation of AlAsSb interlayers/
|
Andrews, A. M
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
25 |
|
Application-driven development of plasma source technology/
|
Hopwood, J
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
26 |
|
Application of magnetic neutral loop discharge plasma in deep silica etching/
|
Chen, W
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
27 |
|
Aspect ratio dependent plasma-induced charging damage in rf precleaning of a metal contact/
|
Kim, J
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
28 |
|
Atomic force microscopy investigation of nanometer-scale modifications of polymer morphology caused by ultraviolet irradiation/
|
Nowicki, M
|
Published for the Society by the American Institute of Physics
|
2000
|
|
|
29 |
|
Atomic layer deposition of Al~2O~3 thin films using dimethylaluminum isopropoxide and water/
|
Cho, W
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
30 |
|
Atomic layer deposition of zirconium silicate films using zirconium tetra-tert-butoxide and silicon tetrachloride/
|
Kim, W.-K
|
Published for the Society by the American Institute of Physics
|
2003
|
|
|
31 |
|
Author Index to Volume 18 ///
|
|
Published for the Society by the American Institute of Physics
|
2000
|
|
|
32 |
|
Author Index to Volume 19 ///
|
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|
33 |
|
The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition/
|
Ito, Natsuko
|
Published for the Society by the American Institute of Physics
|
2001
|
|
|